Metal Alloy High Purity Titanium Sputtering Target | Lemondedudroit

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Titanium Sputtering Targets can be used for flat display coating, ornamental coating and semiconductor components. This is also one the key materials used to make integrated circuits.

High Purity Titanium Suttering Target for Metal Alloy:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
The target for titanium sputtering is made from titanium metal. This is a strong and lightweight material that is well-respected. Titanium metal, a heavy metal that has low density is very ductile in an oxygen-free atmosphere. This makes it lustrous and metallic-white. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low electrical and thermal conductivity, it is also paramagnetic.

Application:
This is mainly for flat panel application, DRAMS, integrated circuit and flat panel displays.

Transportation & Payments:

Steel Alloy High Purity Ti Titanium Sputtering Target Property

Other Titles The Titanium sputtering goal
N/A
Compound Formula Ti
Molecular Weight N/A
Appearance N/A
Melting Point N/A
Solubility In Water N/A
Density N/A
Purity 99.6%
Size Individualized
Boling Point N/A
Specific Heat N/A
Thermo Conductivity N/A
Thermal Expansion N/A
Young’s Module N/A
Exact N/A
Monoisotopic N/A

Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information

Safety Notice N/A
Hazard Statements N/A
Flashing Point N/A
Hazard Codes N/A
Risk Codes N/A
Safety statements N/A
RTECS # N/A
Transport Information N/A
WGK Germany N/A

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